沉积气压对磁控溅射ZrO_(2)薄膜光性能的影响

Effects of deposition pressure on optical properties of the ZrO2 films prepared by magnetron sputtering

为了探究沉积气压对ZrO_(2)薄膜光学特性的影响规律,以玻璃和硅片为基底,利用射频磁控溅射的方法在不同沉积气压下制备ZrO_(2)薄膜样品.通过分光光度计测定薄膜在可见光波段的透射光谱,利用椭圆偏振谱仪表征薄膜的折射率、消光系数、厚度等光学参量,利用原子力显微镜观测薄膜表面的微观结构等.结果表明:①薄膜的沉积速率随沉积气压的增大而减小,沉积气压为0.4 Pa时沉积速率最大,为0.033 nm/s,沉积气压为1.0 Pa时沉积速率最小,为0.011 nm/s;②当沉积气压为1.0 Pa时,200~1000 nm波段薄膜的平均透射率和折射率均最高,分别为82.71%和2.35,表现出良好的透光性;③沉积气压对薄膜消光系数的影响较小;④不同沉积气压下制备薄膜的表面粗糙度也不同,沉积气压为1.0 Pa时薄膜的粗糙度最低,为5.5 nm,沉积气压为0.6 Pa时薄膜的粗糙度最高,为25.2 nm.

In order to explore the effects of deposition pressure on optical properties of the ZrO_(2)thin films,which were prepared by r.f.magnetron sputtering on glass and silicon slices under different deposition pressures.The transmission spectra of the films in the visible range were measured by a spectrophotometer.Optical parameters including refractive index,extinction coefficient as well as thickness were characterized by the ellipsometer.Surface morphology of the films was observed by the atomic force microscopy.The results showed that:①The deposition rate decreased with the increase of deposition pressure.The maximum deposition rate of 0.033 nm/s was achieved at 0.4 Pa while the minimum rate of 0.011 nm/s was obtained at 1.0 Pa.②When the deposition pressure was 1.0 Pa,the average transmissivity and refractive index of the films in the 200-1000 nm band were the highest,the values of which were 82.71%and 2.35 respectively,and the film showed good transmissivity.③The deposition pressure had little effects on extinction coefficient of the films.④The surface roughness of the film obtained under different deposition pressure is also different.The minimum roughness of 5.5 nm and the maximum one of 25.2 nm for the films were obtained at 1.0 Pa and 0.6 Pa,respectively.