不同沉淀剂制备氧化铈抛光粉

Cerium Oxide Polishing Powder Prepared from Different Precipitating Agent

氧化铈(CeO_(2))抛光粉在光学玻璃、手机盖板、集成电路等领域内有着广泛的应用。合成高端CeO_(2)抛光粉主要采用液相沉淀得到前驱体,再经过煅烧转型制得CeO_(2)。前驱体是决定CeO_(2)抛光粉性质和性能的关键因素之一。通过模拟工业上常用的制备方法,以氯化铈(CeCl_3)为铈源,使用碳酸钠(Na_(2)CO_(3))、碳酸铵[(NH_(4))_(2)CO_(3)]、碳酸氢铵(NH_(4)HCO_(3))、二水合草酸(H_(2)C_(2)O_(4)·2H_(2)O)和氢氧化钠(NaOH)为沉淀剂,合成了一系列CeO_(2)抛光粉的前驱体。利用X-射线衍射仪(XRD)、扫描电子显微镜(SEM)、激光粒度仪等手段表征了前驱体的晶相、形貌、粒度等性质,并研究了前驱体煅烧转型后的CeO_(2)性质及其对K9光学玻璃的抛光性能。结果表明:采用(NH_(4))_(2)CO_(3)为沉淀剂制备的前驱体最佳,其物相以Ce_(2)O(CO_(3))_(2)·H_(2)O为主,微观形貌主要呈米粒状,粒度为200~500 nm,其煅烧转型后形成的CeO_(2)抛光粉的平均粒径为90 nm,且分布较为均匀,对K9玻璃的抛光质量最佳且表面粗糙度R_a为1.13 nm。

Cerium oxide(CeO_(2))polishing powder has been widely used in optical glass,mobile phone cover plate,integrated circuit and other fields.The synthesis of high-end cerium oxide polishing powder is mainly obtained by liquid phase precipitation for precursor,and then through calcination transformation to prepare CeO_(2).The precursor is one of the key factors that determine the properties of CeO_(2) polishing powder.Using cerium chloride(CeCl3)as cerium source,sodium carbonate(Na_(2)CO_(3)),ammonium carbonate[(NH_(4))_(2)CO_(3)],ammonium bicarbonate(NH_(4)HCO_(3)),oxalic acid(H_(2)C_(2)O_(4)·2H_(2)O)and sodium hydroxide(NaOH)as precipitating agents,a series of precursors of CeO_(2) were synthesized by simulating the preparation methods commonly used in industry.The crystal phase,morphology and particle size of the precursor were characterized by XRD,SEM and laser particle size analyzer.The properties and polishing performance on K9 glass of CeO_(2) were studied.The results show that the precursor prepared from ammonium carbonate as precipitator is the best.The phase is mainly Ce_(2)O(CO_(3))_(2)·H_(2)O,and its micromorphology is mainly rice granular,with the particle size ranging from 200 nm to 500 nm.The average particle size of CeO_(2) is 90 nm,and its distribution is relatively uniform.The polishing quality of K9 glass is the best,the surface roughness Ra is 1.13 nm.