高通量(场发射)扫描电子显微镜技术进展

Technical progress in high-throughput field emission scanning electron microscope

本文重点阐述高通量扫描电镜概念与发展的过程,具体介绍了高通量扫描电镜拟要解决的问题和对应的设计思路,给出了综合数据通量的定义和影响因素。同时阐述了相应的实现手段,分别从重要模组角度介绍高通量扫描电镜的核心性能。通过实际案例计算,分析比较了高通量扫描电镜与标准场发射扫描电镜间的结果差异。探讨了高通量扫描电镜适合应用的领域,同时指出了目前的设计还存在的不足并展望该技术今后的发展前景。

This work focuses on the generation and development of high-throughput scanning electron microscope.The problems to be solved and the corresponding design ideas are introduced in detail.The definition and influencing factors of comprehensive data flux are also presented.The corresponding implementation method are described and the core performance of high-throughput scanning electron microscope is introduced from the perspective of important modules.The difference between the result of high flux scanning electron microscope and standard field emission scanning electron microscope is compared by a practical case calculation.The potential application fields of this technology are discussed,and the shortcomings of the current design are also shown.Finally,the future development prospect of this technology is prospected.