用于光学玻璃CMP的高效稀土抛光液研究

Research on High-Efficiency Rare Earth Polishing Slurry for CMP of Optical Glass

以纳米二氧化铈(CeO_(2))为磨料,使用球磨与不同化学试剂(如pH值调节剂乙酸、丙酸、植酸和分散剂离子型表面活性剂、非离子型表面活性剂)的协同分散方法制备纳米CeO_(2)抛光液,研究酸性体系下不同抛光液的分散性能与抛光性能。研究表明,球磨时以乙酸为pH值调节剂,调节溶液pH值为3,料球比为1∶4,球磨时间为6 h,球磨后纳米CeO_(2)悬浮液分散效果较好。采用制备的纳米CeO_(2)抛光液对石英玻璃进行抛光实验。结果表明:在磨料质量分数为1%、pH为4的条件下,石英玻璃的材料去除速率最高为409 nm/min,粗糙度仅为0.03 nm;阳离子、非离子型表面活性剂均有助于提升酸性体系下CeO_(2)悬浮液的分散稳定性,而加入非离子表面活性剂AEO-9(脂肪醇聚氧乙烯醚)效果最佳,其能够在提高分散稳定性的基础上改善石英玻璃的表面质量。

A polishing slurry was prepared by using nano cerium oxide(CeO_(2))as abrasive,and the synergistic dispersion method of ball milling and different chemical reagents(such as the pH regulator acetic acid,propionic acid and phytic acid,and the dispersant ionic and nonionic surfactants).The dispersion performance and polishing performance of different slurry in acidic system were studied.The research shows that when using acetic acid as a pH regulator during ball milling,adjusting the pH value of the suspension to 3,the ratio of cerium oxide to milling media is 1∶4(specify by weight),and the ball milling time to 6 h,the dispersion effect of nano CeO_(2)suspension after ball milling is better.Polishing experiments were carried out on quartz glass using prepared nano CeO_(2)polishing slurry.It is found that when polishing with 1%of CeO_(2)at pH 4,the material removal rate(MRR)of quartz glass attains 409 nm/min,and the roughness is 0.03 nm.Both cationic and nonionic surfactants can improve the dispersion stability of CeO_(2)suspensions in acidic systems,while the addition of non-ionic surfactant AEO-9(fatty alcohol polyoxyethylene ether)has the beat effect,which can improve the polishing surface quality of quartz glass when improving the dispersion stability of the polishing slurry.