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Impurities analysis of high-purity osmium target for M-cathode application

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摘要 Impurities and their distributions in osmium targets for M-type cathodes affect the coating quality on porous tungsten and cathode emission performance.Glow discharge mass spectrometry(GDMS)and X-ray photoelectron spectroscopy(XPS)were used to analyze the impurity contents and distributions in the osmium target.The chemical states of impurity elements were analyzed and characterized.The total amount of metallic impurity in the target was lower than 0.01 wt%.
出处 《Rare Metals》 SCIE EI CAS CSCD 2023年第4期1154-1159,共6页 稀有金属(英文版)
基金 financially supported by the Key R&D Program of Ministry of Science and Technology(No.2017YFB0305400)。
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