电子叠层衍射成像技术的突破及应用

Breakthrough and application of electron ptychographytechniques

像差校正透射电子显微镜是材料微观结构和物态高分辨率表征最常用的工具之一,极大地推动了相关学科的发展。近年来,电子显微学领域一个新的突破是电子叠层衍射成像技术。它突破了常规成像技术分辨率的极限,实现了原子晶格振动决定的终极分辨率,并且能够实现纳米尺度电磁物态的高精度成像。文章主要简述了电子叠层衍射成像技术的发展历程、原理和最新进展,最后讨论其应用前景和未来展望。

The aberration-corrected transmission electron microscope is one of the most widely used tools for high-resolution characterization of the microstructure and physical state of materials,and has greatly advanced the development of many scientific fields.One of the latest breakthroughs in electron microscopy is electron ptychography,which can achieve the ultimate resolution limited by atomic lattice vibrations,surpassing the resolution limits of all conventional imaging techniques.Moreover,it allows for high-precision imaging of nanoscale electromagnetic states.In this article,we review its history,principle,and recent progress,then discuss its potential applications and future directions.