光刻-刻蚀虚拟仿真实验的设计与实施

Design and Implementation of Photolithography Etching Virtual Simulation Experiment

对焦国家中国芯开发战略,自主设计开发光刻-刻蚀虚拟仿真实验。实验以芯片生产过程中的光刻-刻蚀工艺作为代表,通过虚拟仿真技术进行设备建模、光路模拟、微观粒子运动演示等,将无法触及的设备内部结构、复杂的光刻-刻蚀工艺影响、转瞬即逝的微观实验现象直观化展示给实验者,利用“练习模式”和“考试模式”让实验者充分开展实验探索,通过不同模拟情境激发学生学习兴趣。实验解决了光刻-刻蚀实验在高校难以开展的问题,为综合型人才培养打下基础。

Focus on the strategy for the development of national chip,A photolithography etching virtual simulation experiment was designed and developed independently.As the representative,the photolithography etching process in the field of chip production was implied.By means of virtual simulation technology,equipment modeling,light path simulation,micro particle movement demonstration,the internal structure of equipment the complex impacts of photolithography etching technology,fleeting microscopic experiment phenomenons could be shown visually.The design of“practice mode”and“test mode”helped experimenters to carry out the experiments as they want,and learning through different simulated situations could further stimulate students’interests in learning.The experiment solved the difficulty in implementing photolithography etching experiment in colleges,and laid the foundation for comprehensive cultivation of talents.