摘要
研究了二五混水平U型设计在Lee偏差下的均匀性,利用两种不同的新方法,即CHATTERJEE和HU的方法得到了二五混水平U型设计的两个下界,并将它们综合成一个下界,同时以数值实例验证了该综合下界是紧的,且优于以往文献中的下界.
The uniformity of mixed two and five level U-type designs in terms of Lee discrepancy is focused on.Two new methods of CHATTERJEE and HU are used to get two new lower bounds of mixed two and five level U-type designs,and a syntheticlower bound is derived.Numerical examples are also provided to verify that the synthetic lower bound is tight and better than the old one inexisting literature.
作者
李伟
汪政红
LI Wei;WANG Zhenghong(College of Mathematics and Statistics,South-Central Minzu University,Wuhan 430074,China)
出处
《中南民族大学学报（自然科学版）》
CAS
北大核心
2023年第4期571-576,共6页
Journal of South-Central University for Nationalities：Natural Science Edition
基金
国家统计局优选资助项目(2022LY051)
中央高校基本科研业务费专项资金资助项目(CZQ22003)。
关键词
Lee偏差
二五混水平设计
U型设计
下界
Lee discrepancy
mixed two and five level designs
U-type designs
lower bound
