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三氯氢硅的制备及纯化技术研究进展 被引量:1

Research Progress on Preparation and Purification Technology of Trichlorosilane
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摘要 三氯氢硅是一种非常重要的有机硅单体,被广泛应用于光伏及半导体领域。介绍了三氯氢硅常用制备方法及其优缺点,列举了三氯氢硅的纯化方法。在实际生产中,优先选择冷氢法制备三氯氢硅,该方法的关键是研制出高性能催化剂。根据三氯氢硅粗品的杂质种类,选择合适的纯化方法,得到高纯度的三氯氢硅产品。 Trichlorosilane is a very important organosilicon monomer,which is widely used in photovoltaic and semiconductor fields.The commonly used preparation methods of trichlorosilane and their advantages and disadvantages are introduced in this article,the purification methods of trichlorosilane are listed.In practical production process,the preparation of trichlorosilane by cold hydrogen method is preferred.The point of this approach is to develop a high-performance catalyst,and then select an appropriate purification method according to the impurity type of trichlorosilane crude products to obtain high-purity trichlorosilane products.
作者 缪光武 王术成 吴江平 朱家栋 王传钊 郑瑞鹏 曾群 刘武灿 MIAO Guangwu;WANG Shucheng;WU Jiangping;ZHU Jiadong;WANG Chuanzhao;ZHENG Ruipeng;ZENG Qun;LIU Wucan(State Key Laboratory of Fluorinated Greenhouse Gases Replacement and Control Treatment,Zhejiang Research Institute of Chemical Industry Co.,Ltd.,Hangzhou 310023,China)
出处 《低温与特气》 CAS 2023年第3期1-6,共6页 Low Temperature and Specialty Gases
关键词 三氯氢硅 制备 纯化 trichlorosilane preparation purification
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