PCM设备电容参数整体校准方法研究

Research on Overall Calibration Method of PCM Equipment Capacitance Parameters

半导体行业中普遍使用的工艺过程监控设备(PCM设备),是芯片产品中测环节必不可少的测量设备。PCM设备电容参数的准确测量,是保证与电容制作相关工艺参数的重要手段。针对国内PCM设备电容参数暂无溯源途径现状,根据其测试原理,研究了基于在片电容标准件的整体无损校准方法。采用增加绝缘层的半导体工艺,研制了高稳定性、频响至1 MHz、电容低至0.5 pF的在片电容标准件,满足了国内PCM设备电容参数自动校准需求,测量不确定度优于1%。研究了PCM设备电容参数溯源方法,从而保证了芯片产品PCM图形电容量值测量结果的准确一致,提高了计量效率。

Process control monitor(PCM equipment)is widely used in the semiconductor industry.It is necessary in the intermediate test of chip products.The accurate measurement of capacitance parameters of PCM equipment is an important mean to ensure the process parameters related to capacitance manufacturing.Since there is no traceability for the capacitance parameters of domestic PCM equipment at present,after the characteristics of the capacitance parameters test process of PCM equipment has been analyzed,a nondestructive calibration method based on on-wafer capacitor standards is studied.The on-wafer capacitor standards with a value low to 0.5 pF is developed by using semiconductor single chip process and the maximum frequency is 1 MHz,which meets the requirements of the whole automatic calibration of the capacitance parameters of the domestic equipment.The measurement uncertainty is better than 1%,and the stability is better than 0.2%.The traceability method from capacitor parameter of PCM equipment to the highest national/national defense standards,so as to ensure the accuracy and consistency of the measurement results of PCM graphic capacitance of chip products,and improve the periodic inspection efficiency.