离子液体电沉积制备Cu掺杂NiO电致变色薄膜及其性能

Preparation and properties of Cu-doped NiO electrochromic film by electrodeposition in ionic liquid

NiO是一种常见的电致变色材料,元素掺杂改性是改善NiO薄膜电致变色性能的重要方法。以离子液体为介质,采用电沉积法制备Cu掺杂NiO薄膜,并研究Cu元素掺杂对NiO薄膜电致变色性能的影响。结果表明:Cu掺杂NiO薄膜的电致变色性能相较于纯NiO薄膜有明显提升。Cu掺杂含量为6%(原子分数,下同)时,薄膜光调制范围最大,为54.7%,着色效率最高,为61.54 cm^(2)/C,Cu掺杂含量为12%时,薄膜的着褪色响应时间最短,分别达到2.7 s与2.6 s。薄膜的物相结构为面心立方晶相Ni_(1-x)Cu_(x)O,由纳米粒子堆积而成,表面存在大量利于离子扩散的孔隙。

NiO is a common electrochromic material,and element doping modification is an important method to improve electrochromic properties of NiO films.Cu doped NiO films were prepared by electrodeposition in ionic liquid solution,and the effect of Cu doping on the electrochromic properties of NiO films was studied.The results show that the electrochromic properties of Cu doped NiO films are significantly improved compared with pure NiO films.When the Cu doping content is 6%(atomic fraction,the same below),the light modulation range of the film is the largest,which is 54.7%,and the coloring efficiency is the highest,which is 61.54 cm^(2)/C.When the Cu doping content is 12%,the coloring and fading response time of the film is the shortest,reaching 2.7 s and 2.6 s,respectively.The phase structure of the film is face centered cubic crystalline Ni_(1-x)Cu_(x)O and the film is composed of nanoparticles.There are a large number of pores on the surface which are conducive to ion diffusion.