摘要
Chemical vapor deposition(CVD)approach offers a controllable strategy for preparing large‐area and high‐quality few‐layer(mainly bilayer or trilayer)twisted or untwisted two‐dimensional(2D)materials,and is predicted to boost the development of 2D materials from laboratory research to industrial applications.
基金
National Natural Science Foundation of China,Grant/Award Number:52002267
National Key R&D Program of China,Grant/Award Number:2021YFA0717900。
