卤族酸液刻蚀制备Ti_(3)C_(2)T_(x)MXene及性能研究

Fabrication and properties of halogen acid-etched Ti_(3)C_(2)T_(x) MXene

Ti_(3)C_(2)T_(x)基于其金属导电性和表面可调性,被广泛被应用于能量转换与存储领域。通过对比研究盐酸、氢氟酸、氢溴酸及各种酸液组合对Ti_(3)AlC_(2)刻蚀产物Ti_(3)C_(2)的物相、形貌及电化学性能的影响,探索各卤族酸对Ti_(3)AlC_(2)的刻蚀机理。实验结果表明,HCl+HF+H_(2)O混合酸液在60℃下对Ti_(3)AlC_(2)刻蚀结果较佳,刻蚀产物Ti_(3)C_(2)T_(x)的纯度较高,底液具有类手风琴状;上清液为薄片状,且具有较好的韧性和丁达尔光学效应。通过结合氢氟酸的强腐蚀和盐酸的强酸,在考虑安全与环保的前提下,制备出的Ti_(3)C_(2)T_(x)纯度高,电化学性能好。

Ti_(3)C_(2)T_(x) has been widely used in the field of energy conversion and storage due to its metallic conductivity and surface tunability.The effects of hydrochloric acid,hydrofluoric acid,hydrobromic acid and various acid combinations on the phase,morphology and electrochemical properties of Ti_(3)AlC_(2) etched product Ti_(3)C_(2)T_(x) were studied for the first time in order to explore the etching mechanism of Ti_(3)AlC_(2) etched product by various halogen acids.The experimental results showed that the etching results of Ti_(3)AlC_(2) by HCl+HF+H_(2)O mixed acid solution at 60℃were better,with higher purity of etching product Ti_(3)C_(2)T_(x),accordion-like bottom solution and thin sheet supernatant,which had good toughness and Tyndall optical effect.By combining the strong corrosion of hydrofluoric acid and the strong acid of hydrochloric acid,Ti_(3)C_(2)T_(x) was prepared with high purity and good electrochemical performance under the premise of safety and environmental protection.