基于180nm工艺的SoC芯片设计DRC验证分析

Analysis of DRC Verification of SoC Chip Design Based on 180nm Process

阐述一款SoC芯片在180nm工艺中的DRC验证流程和方法,探讨使用后端设计工具Innovus导出GDSII数据时MapFile文件的设置、DummyMetal的添加、GDSII数据的合并,最终通过Calibredrv打开GDSII数据,查看DRC结果,提出修复DRC错误的方法。

This paper describes the DRC verification process and method of a SoC chip in the 180nm process,and discusses the MapFile file setting,the addition of DummyMetal,and the combination of GDSII data when using the back-end design tool Innovus to export GDSII data.Finally,open GDSII data through Calibredrv,view DRC results,and fix DRC errors.