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Effects of twin orientation and twin boundary spacing on the plastic deformation behaviors in Ni nanowires 被引量:1

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摘要 Spreading twins throughout nano metals has been proved to effectively mediate the mechanical behaviors in face-centered-cubic(fcc)metals.However,the experimental investigation concerning the roles of twin boundary(TB)during deformation is rarely reported.Here,with the joint efforts of in-situ nanomechani-cal testing and theoretical studies,we provide a systematic investigation regarding the effects of TB orien-tation(θ,the angle between tensile loading direction and the normal of TB)and spacing on deformation mechanisms in Ni nanowires(NWs).As compared with single-crystalline counterparts,it is found that nano-twinned(nt)NWs withθ∼0°exhibit limited ductility,whereas TB can serve as an effective block-age to the dislocation propagation.In contrast,in nt NWs withθ∼20°and 55°,TB migration/detwinning induced by TB-dislocation reaction or partial dislocation movement dominates the plasticity,which con-tributes to enhanced NW ductility.Regarding nt NWs withθ∼90°,dislocations are found to be able to transmit through the TBs,suggesting the limited effect of TB on the NW stretchability.Furthermore,de-creasing TB spacing(λ)can facilitate the detwinning process and thus greatly enhance the ductility of NW withθ∼55°.This study uncovers the distinct roles that TB can play during mechanical deforma-tions in fcc NWs and provides an atomistic view into the direct linkage between macroscopic mechanical properties and microscopic deformation modes.
出处 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2023年第4期231-240,共10页 材料科学技术(英文版)
基金 This work was financially supported by the National Natural Science Foundation of China(Nos.52071237,12074290,51871169,52101021,and 12104345) the Natural Science Foundation of Jiangsu Province(No.BK20191187) the Young Top-notch Talent Cultivation Program of Hubei Province,the Science and Technology Program of Shenzhen(No.JCYJ20190808150407522) the China Postdoctoral Science Foundation(No.2019M652685).
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