期刊文献+

基于BP神经网络的碳化硅MOSFET栅极老化监测方法研究

Research on Gate-oxide Degradation Monitoring Method of SiC MOSFET Based on BP Neural Network
下载PDF
导出
摘要 针对碳化硅MOSFET运行工况复杂、易造成器件栅极老化、影响电力系统可靠性的问题,提出一种基于BP神经网络的碳化硅MOSFET栅极老化监测方法。以碳化硅MOSFET的阈值电压和体二极管通态压降作为栅极老化的敏感表征参数,设计、搭建测试实验平台,获取变测量条件下的电参数值,结合BP神经网络提取健康器件与老化器件样本数据间的特征差异,充分挖掘器件的可靠性信息。实验结果表明:该方法可对碳化硅MOSFET的栅极老化状态进行较为准确的检测和评估。 Aiming at the problem of gate-oxide degradation of SiC MOSFET caused by complex operating conditions,which could affect the reliability of the power electronic systems,a BP neural network-based gate-oxide degradation monitoring method of SiC MOSFET was proposed.The threshold voltage of SiC MOSFET as well as the on-state voltage of the body diode were chosen as the sensitive parameters of gate-oxide degradation,and a test experimental platform was designed and built to obtain the two parameters under variable measurement conditions.The BP neural network was used to extract the differences between the healthy devices and the degraded devices,and fully explore reliability information of the devices.The results show that this method can accurately test and evaluate the gate-oxide degradation state of SiC MOSFET.
作者 陈一凡 王景霖 崔江 王友仁 CHEN Yifan;WANG Jinglin;CUI Jiang;WANG Youren(College of Automation and Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China;AVIC Shanghai Aero Measurement and Control Technology Research Institute,Shanghai 201601,China;Aviation Key Laboratory of Science and Technology on Fault Diagnosis and Health Management Technology,Shanghai 201601,China)
出处 《机械制造与自动化》 2023年第4期193-195,201,共4页 Machine Building & Automation
基金 航空科学基金项目(201933052001) 中央高校基本科研业务费专项资金资助项目(NS2021021)。
关键词 碳化硅MOSFET 栅极老化 阈值电压 BP神经网络 SiC MOSFET gate oxide degradation threshold voltage BP neural network
  • 相关文献

参考文献4

二级参考文献38

  • 1马兆青,袁曾任.基于栅格方法的移动机器人实时导航和避障[J].机器人,1996,18(6):344-348. 被引量:91
  • 2朱云国,周松林.基于BP神经网络的移动机器人路径规划[J].煤矿机械,2007,28(8):42-44. 被引量:6
  • 3Van Wyk J D.Power electronics technology at the dawn of a new century-past achievements and future expectations [C]//International Power Electronics and Motion Control Conference.Beijing,China:IEEE,2000:9-20.
  • 4Majumdar G.The future of power devices[C]//Power Electronics Specialists Conference.Aachen,Germany:IEEE,2004:10-15.
  • 5Bernet S.Recent developments of high power converters for industry and traction applications[J].IEEE Transactions on Power Electronics,2000,15(6):1102-1117.
  • 6FT1500 AU-120,Mitsubishi general use thyristor[R].Mitsubishi Electric,Datasheet,1999.
  • 7T2871N80TOH,Phase Control Thyristor[R].EUPEC,Datasheet,2002.
  • 8Niedernostheide F J,Schulze H J,Kellner-Werdehausen U,et al.13 kV Rectifiers:Studies on diodes and asymmetric thyristors[C]//International Symposium on Power Semiconductor Devices and ICs.Cambridge,UK:IEEE,2003:122-125.
  • 9Lorenz L.Power semiconductors development trends[C]// International Power Electronics and Motion Control,Shanghai,China:IEEE,2006:1-7.
  • 10Kitagawa M,Omura I,Hasegawa S,et al.A 4 500 V injection enhanced insulated gate bipolar transistor (IEGT) in a mode similar to a thyritor[C]//Proceedings of the IEEE International Electron Devices Meeting.1993:679-682.

共引文献346

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部