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生长条件参数对碳纳米管阵列定向性的影响

Influence of deposition condition parameters on directionality of carbon nanotube arrays
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摘要 采用化学气相沉积法(CVD)制备出了结构可控的碳纳米管阵列,并对其定向性进行了系统研究。采用扫描电子显微镜(SEM)和X射线衍射仪(XRD)对样品的形貌和结构进行了表征。结果发现碳纳米管阵列的石墨化程度及定向性受催化剂浓度、生长基底位置、载气流速因素影响。结果表明,过低或过高的催化剂浓度以及载气流速都会使得碳纳米管阵列的定向性变差。而生长位置离基底中心越近,碳纳米管阵列的定向性越好。 Aligned carbon nanotube arrays(ACNTs)which could be controlled have been prepared by chemical vapor deposition(CVD),and their directionality of ACNTs have also been investigated systematically.The morphology and structure of products are characterized by scanning electron microscopy(SEM)and X-ray diffractometry(XRD).The results indicate that the directionality of ACNTs could be affected by concentration of catalyst,location of growth substrate and flowing rate of carrier gas.Too low or too high catalyst concentration of catalyst and flowing rate of carrier gas will make the directionality of carbon nanotubes arrays poor.The nearer to the base center,the better the directionality of the carbon nanotube arrays.
作者 樊元东 马康夫 李斌 魏汝省 张辰宇 张馨丹 FAN Yuan-dong;MA Kang-fu;LI Bin;WEI Ru-sheng;ZHANG Chen-yu;ZHANG Xin-dan(Forty-sixth Institute,China Electronics Technology Group Corporation,Tianjin 300000,China;Shanxi SemiCore Crystal Co,Ltd,Taiyuan 030062,China)
出处 《磁性材料及器件》 CAS 2023年第4期19-24,共6页 Journal of Magnetic Materials and Devices
关键词 碳纳米管阵列 化学气相沉积 生长条件参数 定向性 carbon nanotube arrays chemical vapor deposition(CVD) deposition condition parameters directionality
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