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一种新型环形上DBR刻蚀微结构VCSEL及其空心光束

A novel ring-shaped top-DBR etched microstructure VCSEL with a hollow beam
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摘要 设计了带有质子注入高阻区的刻蚀微结构面发射半导体激光器结构,使得从出光口到上DBR形成环形波导,进而直接产生空心激光束输出。使用FDTD软件计算了刻蚀微结构VCSEL的光场分布,得到的环形模式图样在不同模式数目下都能保持空心光束的特性。制备了室温下激射波长为848 nm的微结构VCSEL,并测试其输出特性。阈值电流为0.27 A,峰值功率最高可达170 mW。不同电流下的近场图都显示出非常明显的空心环形光斑,远场光强分布曲线也符合空心光束的特性。该新型VCSEL技术为空心光束甚至阵列器件的发展提供了一种新的方法。 The structure of a novel ring-shaped top-DBR etched microstructure VCSEL with a proton implantation high resistance region was designed.A ring column structure was formed from the upper electrode to the active re⁃gion,which directly generated a hollow laser beam output.The optical field distribution of the etched microstruc⁃ture VCSEL was calculated by FDTD software,and the obtained ring-shaped patterns maintained the hollow beam characteristics under the different mode numbers.We fabricated the etched microstructure VCSEL with a lasing wavelength of 848 nm at room temperature and investigated its performance.The threshold current was 0.27 A and the peak power was up to 170 mW.The near-field patterns of different currents clearly displayed hol⁃low ring-shaped spots.The distribution curves of far-field light intensity matched the characteristics of a hollow beam as well.This novel VCSEL provides a new approach for the development of hollow beams and even array devices.
作者 逄超 晏长岭 杨静航 钱冉 李奕霏 PANG Chao;YAN Chang-Ling;YANG Jing-Hang;QIAN Ran;LI Yi-Fei(State Key Lab on High Power Semiconductor Lasers,Changchun University of Science and Technology,Changchun 130000,China)
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2023年第4期462-467,共6页 Journal of Infrared and Millimeter Waves
基金 Supported by Jilin Province Science and Technology Department project(20220101122JC) Changchun University of Science and Technology project(627011102)。
关键词 垂直腔面发射半导体激光器 空心激光束 刻蚀结构 质子注入 vertical cavity surface emitting laser hollow laser beam etched microstructure proton implantation
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