半导体厂房气态分子污染物控制探讨

Reviews on control of airborne molecular contaminants in semiconductor plants

气态分子污染物(AMC)越来越成为半导体厂房建设、运营过程中需要解决的主要问题之一。本文结合AMC控制原理、技术标准、实际工程经验、工厂运行数据、实验数据等简要阐述了半导体厂房对AMC的控制要求、废气排放高度对新风入口位置的影响、新风空调机组中水洗装置的设计要点、各种化学过滤器的性能参数,为同类项目的建设提供参考。

Airborne molecular contaminants(AMC)have increasingly become one of the major problems to be solved in the construction and operation of semiconductor plants.This paper combines AMC control principles,technical standards,actual engineering experience,plant operation data,experimental data,etc.,to briefly expound the control requirements of semiconductor plants for AMC,the influence of exhaust emission height on the position of outdoor air inlet,the design points of water washing devices in outdoor air conditioning units,and the performance parameters of various chemical filters,so as to provide references for the construction of similar projects.