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铜、锌离子浓度比对羟基乙叉二膦酸体系电镀黄铜的影响

Effect of Cu^(2+)/Zn^(2+)concentration ratio on brass electroplating from 1-hydroxyethylidene-1,1-diphosphonic acid-based bath
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摘要 以羟基乙叉二膦酸(HEDP)为配位剂进行电镀黄铜(Cu–Zn合金),通过阴极极化测试、循环伏安分析、扫描电镜(SEM)观察、X射线衍射(XRD)等手段研究了Cu^(2+)/Zn^(2+)浓度比对电沉积过程及镀层微观结构的影响。结果表明,HEDP体系中Cu–Zn合金电沉积的电位介于Cu和Zn之间。随Cu^(2+)/Zn^(2+)浓度比减小,Cu–Zn合金的初始沉积电位正移,共沉积得到促进,镀层的Zn质量分数增大。Cu^(2+)/Zn^(2+)浓度比为1:4时所得Cu–Zn合金镀层为金黄色,微观上呈均匀分布的胞状结构,镀层中Cu的质量分数在65%~70%之间,与氰化物电镀黄铜的组成最接近。 Brass(Cu–Zn alloy)electroplating was carried out with 1-hydroxyethylidene-1,1-diphosphonic acid(HEDP)as complexing agent.The effect of Cu^(2+)/Zn^(2+)concentration ratio on the electrodeposition process and microstructure of deposit was studied by cathodic polarization measurement,cyclic voltammetry,scanning electron microscopy(SEM),and X-ray diffraction(XRD).The results showed that the electrodeposition potential of Cu–Zn alloy was between the deposition potentials of Cu and Zn.With the decreasing of the concentration ratio of Cu^(2+)to Zn^(2+),the initial deposition potential of Cu–Zn alloy shifted toward a positive direction,which indicated that the codeposition of Cu–Zn alloy was promoted,resulting in an increase of zinc content in the deposit.The Cu–Zn alloy coating electrodeposited at a Cu^(2+)/Zn^(2+)concentration ratio of 1:4 was golden yellow,exhibited a uniformly distributed cellular structure microscopically,and contained 65%to 70%by mass of Cu,which was close to the composition of Cu–Zn alloy coating electrodeposited from a cyanide-containing bath.
作者 袁景追 喻岚 陈惠敏 陈宝来 李能 刘瑞祥 王帅星 杜楠 YUAN Jingzhui;YU Lan;CHEN Huimin;CHEN Baolai;LI Neng;LIU Ruixiang;WANG Shuaixing;DU Nan(AECC Guizhou Honglin Aero-engine Control Technology Corporation Ltd.,Guiyang 550009,China;School of Materials Science and Engineering,Nanchang Hangkong University,Nanchang 330063,China)
出处 《电镀与涂饰》 CAS 北大核心 2023年第17期1-7,共7页 Electroplating & Finishing
基金 中国航空发动机集团产学研合作项目(HFZL2020CXY026)。
关键词 电镀黄铜 羟基乙叉二膦酸 铜锌离子浓度比 阴极极化 微观结构 brass electroplating 1-hydroxyethylidene-1,1-diphosphonic acid ratio of copper ion concentration to zinc ion concentration cathodic polarization microstructure
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  • 1张颖,王晓轩,陶珍东,李小涛.玻璃钢饰面技术——无氰二元仿金电镀工艺研究[J].工程塑料应用,1994,22(6):17-20. 被引量:6
  • 2文斯雄.锌合金零件无氰仿金装饰电镀[J].材料保护,2005,38(9):68-69. 被引量:3
  • 3何丽芳,郭忠诚.无氰仿金电镀的研究现状[J].电镀与涂饰,2006,25(3):51-54. 被引量:20
  • 4陈文亮.电镀仿金工艺的改进和提高[J].电镀与精饰,1987,9(1):18-18.
  • 5任宏政.24K仿金电镀及色泽控制[J].电镀与环保,2000,20(4):36-36.
  • 6ABBOTT C N. Zinc-copper alloy electroplating baths: US, 3930965 [P]. 1976-01-06.
  • 7HARBULAK E P, LASH R J. Improvements in or relating to brass plating: GB, 1526660 [P]. 1978-09-27.
  • 8AMEEN T J, ORIOFF G L. Non-cyanide brass plating bath and a method of making metallic foil having a brass layer using the non-cyanide brass plating bath: US, 5762778 [J]. 1998-06-09.
  • 9Desipic A R,et al.Kinetics of deposition and dissolution of bass from the pyrophosphate-oxalate bath[J].Journal of Electroanalytical Chemistry,1992,339(1-2):473.
  • 10De Filippo.D,et al.A tartrate-based alloy bath for brass-plated steel wire production[J].Journal of Applied Electrochemistry,1992,22(1):64.

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