两步法制备MoSe_(2)薄膜的结构与摩擦学性能

Structure and tribological properties of MoSe_(2) films prepared by two-step process

为了扩大固体润滑剂MoSe_(2)的应用领域,采用两步法制备MoSe_(2)薄膜。首先通过磁控溅射法在基底上沉积MoSe_(x)预制层,随后在Se蒸气中进行硒化处理得到MoSe_(2)薄膜。研究溅射和硒化过程对薄膜结构和摩擦学性能的影响。结果表明,两步法所制备的MoSe_(2)薄膜呈(002)晶面平行于基底的择优取向,结晶度得到提高。所制备的MoSe_(2)薄膜在空气环境下具有良好的耐磨性和润滑性能,其最低平均摩擦因数为0.0443,比磨损率为1.03×10^(−5) mm^(3)/(N·m)。此外,还探讨了MoSe_(2)薄膜的润滑机理,可通过黏附机制和填充修复机制起到减摩润滑的作用。

In order to extend the application range of solid lubricant MoSe_(2),a two-step process was adopted to prepare the MoSe_(2) film.Namely,the MoSe_(x) precursor layer was firstly deposited on the substrate by magnetron sputtering method,and then selenized in a Se vapor atmosphere to obtain MoSe_(2) film.The effects of the sputtering and selenization process on the structure and tribological properties of the films were investigated.The results show that the two-step prepared MoSe_(2) films exhibit a preferential orientation with(002)basal plane parallel to the substrate and an improved crystallinity.The prepared MoSe_(2) film has good wear resistance and lubricating performance in an ambient air environment,with the lowest average friction coefficient of 0.0443 and a specific wear rate of 1.03×10^(−5) mm^(3)/(N·m).In addition,the lubrication effects of MoSe_(2) films through the adhesion mechanism and fill in-repair mechanism were further discussed.