摘要
无掩膜数字光刻机已在PCB光刻及半导体光刻领域逐渐开始应用,相比传统掩膜式光刻机,可缩减光刻流程,节省光刻成本,使光刻数据在线实时调整变得更为简单。而DMD(数字微镜器件)目前作为数字光刻机常用的一种SLM(空间光调制)图形发生器,对其所需要进行的数据处理及控制较为关键。会直接关系到数字光刻机的曝光效率和产能。文章从DMD的驱动控制原理,探讨研究DMD在数字光刻机中的数据处理和控制流程、方法,实现较高的设备光刻效率。
Maskless digital lithography machine has been gradually applied in PCB lithography and semiconductor lithography fields.Compared with traditional mask lithography machine,it reduces the lithography process,saves the lithography cost,and makes it easier to adjust the lithography data online in real-time.As a SLM pattern generator commonly used in digital lithography,DMD is very important for the required data processing and control.It is directly related to the exposure efficiency and productivity of digital lithography machine.In this paper,from the driving control principle of DMD,the data processing and control process and method of DMD in digital lithography machine are discussed,so as to achieve higher lithography efficiency of equipment.
作者
陈海巍
CHEN Haiwei(Jiangsu Yingsu Integrated Circuit Equipment Co.,Ltd.,Wuxi 214000,China)
出处
《现代信息科技》
2023年第18期129-132,共4页
Modern Information Technology