一种高压电缆缓冲层烧蚀修复技术

Ablation Repair Technology for Buffer Layers of High Voltage Cables

为了解决高压电缆缓冲层烧蚀故障的问题,对高压电缆烧蚀状况进行了分析,并对研制的半导电修复液体进行了相关的验证,最终提出了一种高压电缆缓冲层烧蚀故障解决方案,即通过加注设备将半导电修复液体注入金属套和绝缘屏蔽层间的空隙,通过重新建立轴向的电气连接通道,抑制高压电缆烧蚀的发展,降低电缆烧蚀导致的故障率,延长电缆寿命。该解决方案在正常运行的110 kV电缆线路中进行了应用验证,经红外热成像扫描发现,电缆原有烧蚀发热点全部消失,且电缆已安全运行了5040 h,达到了一定的修复效果,具有一定的参考价值。

Buffer layers of high voltage cables have experienced ablation failures which cause significant safety hazards to the power system.In order to solve this problem,ablation status of high voltage cables was analyzed and developed semiconductor repair solution was verified.A solution of ablation failure for buffer layers of high voltage cables was proposed finally,which was to inject semiconductor repair solution into the gap between metal sheath and insulation screen by filling equipment.Ablation development of high voltage cables was suppressed by rebuilding axial electrical connection channel.Besides,failure rate caused by cable erosion was reduced and cable life was extended.This solution was verified in the normal operation of 110 kV cable lines.Through infrared thermal imaging scanning,it was found that all the original erosion hotspots of the cable had disappeared,and the cables had been running well for more than 5040 h,which achieved a certain repair effect and provided a certain reference value.