负偏压对高界面强度类金刚石薄膜制备的影响

Effect of negative bias voltage on preparationof diamond-like carbon films with high interfacial strength

为解决类金刚石(DLC)薄膜与金属基材间的界面结合强度和厚膜化问题,提出一种使用a-Si:C:H键合层和H-DLC过渡层的新工艺。利用直流等离子体增强化学气相沉积(DC-PECVD)方法,在45钢基材上沉积不同负偏压条件下的复合DLC薄膜,并对薄膜的厚度、表面粗糙度、结构成分、残余应力、膜基结合力以及摩擦学性能进行测定和分析。结果表明:当顶层薄膜的制备负偏压从600 V增加至1200 V时,薄膜表面粗糙度增大,总膜厚增加,最大达到16.3μm;薄膜中的残余应力呈增大趋势,结合力减小;薄膜的平均磨损率增大,耐磨性逐渐下降。顶层薄膜制备负偏压为600 V时,复合DLC薄膜的综合性能最优,结合力达到了54.6 N,平均磨损率为1.5×10^(-16) m^(3)/(N·m),使45钢的耐磨性提高了30倍。

In order to solve the problem of interfacial bonding strength and thick film between diamond-like carbon(DLC) film and metal substrate,a new process using a-Si:C:H bonding layer and H-DLC transition layer was proposed.The composite DLC films under different negative bias voltage conditions were deposited on the 45 steel substrate by using DC plasma enhanced chemical vapor deposition(DC-PECVD) method,and the thickness,surface roughness,structural composition,residual stress,film-substrate adhesion and tribological properties of the films were measured and analyzed.The results show that when the negative bias voltage of the top layer film increases from 600 V to 1200 V,the surface roughness of the film increases,and the total film thickness increases to a maximum of 16.3 μm.The residual stress in the film tends to increase and the adhesion force decreases.The average wear rate of the film increases,and the wear resistance gradually decreases.When the negative bias voltage of the top film is 600 V,the composite DLC film has the best comprehensive performance,the bonding force reaches 54.6 N,the average wear rate is 1.5×10^(-16) m^(3)/(N·m),and the wear resistance of 45 steel is improved by 30 times.