政府研发补贴、知识产权保护与高技术产业创新效率——基于门槛效应的实证分析

Government R&D Subsidies,Intellectual Property Protection and Innovation Efficiency in High-tech Industries:An Empirical Analysis Based on Threshold Effect

政府研发补贴以及知识产权保护作为国家制度安排对我国高技术产业的创新效率至关重要。文章选取我国2010—2020年28个省级面板数据,运用Tobit回归模型实证研究了政府研发补贴以及知识产权保护对高技术产业创新效率的影响;同时通过面板门限回归,探究不同知识产权保护水平下政府研发补贴对高技术产业创新效率的作用机理。研究发现:在全国层面,政府研发补贴对高技术产业创新效率有显著正向作用;知识产权保护对高技术产业创新效率有显著的正向作用,其中在东、中、西部地区,政府研发补贴和知识产权保护对创新效率表现出异质性;政府研发补贴对高技术产业创新效率存在着以知识产权保护为门槛的非线性单一门槛效应。

As institutional arrangements,government R&D subsidies and intellectual property protection are crucial to the innovation efficiency of China’s high-tech industries.Based on the panel data of 28 provinces in China from 2010 to 2020,Tobit regression model is used to empirically study the impact of government R&D subsi⁃dies and intellectual property protection on the innovation efficiency of high-tech industries;meanwhile,the paper explores the functional mechanism of government R&D subsidies on innovation efficiency of high-tech industries in different levels of intellectual property protection by panel threshold regression.The results show that:Government R&D subsidies can significantly promote innovation efficiency of high-tech industries at the national level;intellec⁃tual property protection can significantly promote innovation efficiency of high-tech industries,in which government R&D subsidies and intellectual property protection have shown heterogeneity on innovation efficiency in the east⁃ern,central and western regions;government R&D subsides on the innovation efficiency of high-tech industries has a nonlinear single threshold effect with intellectual property protection as the threshold.