响应面优化香菇真空远红外干燥工艺研究

Response surface optimization of vacuum far infrared drying process for shiitake mushrooms

为探究香菇真空远红外干燥的最佳工艺参数,在单因素试验的基础上,采用Box-Behnken响应面法优化参数。试验以干燥温度、辐照高度和功率为因素,总色差值、复水比和平均干燥速率为评价指标,探讨了各因素对香菇真空远红外干燥的试验指标的影响,并建立各指标的二次回归方程。结果表明,建立的回归模型显著;香菇真空远红外干燥的较优工艺参数组合为:干燥温度60℃、辐照高度300 mm、功率600 W,在此条件下干制品的总色差值为13.45、复水比为1.9360、平均干燥速率为0.0103%·min-1。研究可为香菇的生产加工提供理论参考。

In order to obtain high quality dried shiitake mushrooms,vacuum far infrared drying technology was used.Using the Box-Behnken response surface method,the total colour difference value,rehydration ratio and average drying rate of shiitake mushrooms as evaluation indexes,response surface optimization analysis was conducted to explore the effect of the interaction of drying temperature,irradiation height and power on the test indexes,and the quadratic regression equation of each index was established to determine the optimal process conditions for vacuum far infrared drying of shiitake mushrooms.The results show that the optimal combination of process parameters for vacuum far-infrared drying of shiitake mushrooms:drying temperature 60°C,irradiation height 300 mm and power 600 W.The total colour difference value of the dried products under these conditions is 13.45,rehydration ratio 1.9360 and average drying rate 0.0103%·min-1.The test shows that the vacuum far infrared drying method can obtain higher quality shiitake mushrooms and the study can provide a theoretical reference for the production and processing of high quality dried shiitake mushrooms.