掺杂非晶碳膜制备、性能及应用

Preparation and Performance of Doped Amorphous Carbon Thin Films and Study on Their Application

采用磁控溅射方法制备铬(Cr)掺杂非晶碳膜(a-C:Cr),通过XPS、SEM研究了Cr的掺杂比例对非晶碳膜结构与薄膜疏水性能、导电性能、摩擦因数等影响。结果表明:随着Cr掺杂量由0.9%增加到61.07%,薄膜表面愈发粗糙;接触角由79.71°增加到95.56°;摩擦因数由0.146逐渐增大到0.537;a-C:Cr薄膜的结合力为36.15~41 N;薄膜的表面电阻由2.17Ω降低至0.91Ω。消融实验结果显示,当Cr掺杂量大于26.80%时,经a-C:Cr薄膜表面改性的电极针表面组织粘连问题消失,且消融的牛肝体积大于未经表面改性的电极针。

Cr-doped amorphous carbon films(a-C:Cr)were prepared by magnetron sputtering method.The effects of the doping ratios of Cr on the structures of amorphous carbon films,hydrophobic property,electrical conductivity and friction coefficient,etc.,were studied by XPS and SEM.The results showed that with the Cr doping amount increased from 0.9%to 61.07%,the surface of the thin film became rougher,water contact angle of the film increased from 79.71°to 95.56°,the friction coefficient of the film gradually increased from 0.146 to 0.537,adhesion strength of the film ranged from 36.15 to 41 N,and surface electrical resistance of the film decreased from 2.17Ωto 0.91Ω.The results of ox liver ablation experiment showed that when the Cr doping amount was more than 26.80%,the tissue adhesion problem on the surface of the electrode needle disappeared,and the volume of ablation was larger than that of the unmodified electrode needle.