低热辐射紫外固化系统光学薄膜

Low Thermal Radiation UV Cure SSystem Optical Thin Film

紫外光固化技术是一种快速、高效、环保的固化方法,得到了广泛应用。本文分析了低热辐射紫外固化光学系统中紫外石英冷光镜及石英热镜的特征光谱要求,研究采用Ta2O5及SiO2两种镀膜材料,分别设计了紫外反射长波通膜系石英冷光镜及透射紫外光短波通膜系石英热镜。通过等效折射率方法构造两种材料对称周期膜系结构,设计了一种消除次级反射短波通热镜膜系。石英紫外反射镜及热镜组合结构具备紫外波段高反射同时,可滤除近红外光,实现低温下紫外固化。

UV cure technology is a fast,efficient and environmentally friendly cure method which has been widely used.In this paper,the optical characteristic spectrum requirements of quartz UV reflection cold mirror and quartz thermal mirror in low thermal radiation UV cure optical system are analyzed.Two kinds of coating materials,Ta2O5 and SiO2,are used to design the quartz cold miror with long wave pass film reflecting ultraviolet light and the quartz hot mirror with short wave pass film transmitting ultraviolet light respectively.The symmetric periodic film system of two materials was constructed by the equivalent refractive index method to realize the main reflection band and eliminate the secondary reflection band.The combinatorial structure of quartz UV mirror and thermal mirror has a high reflection in the ultraviolet band and can achieve a better cut-off near infrared light and achieve low thermal radiation on the cured surface.