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扩孔钻法经牙槽嵴顶上颌窦底提升的回顾性研究

Crestal sinus floor elevation using the twist drill technique:a retrospective study
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摘要 目的探讨利用扩孔钻法经牙槽嵴顶上颌窦底提升的临床效果。方法收集2018年7月至2020年6月使用扩孔钻法经牙槽嵴顶上颌窦底提升同期种植、同一术者的连续临床病例。纳入患者共109例,均为上颌后牙区单牙或多牙缺失,剩余垂直骨高度为4~9 mm,完成种植体植入144枚。分别在术前、术后即刻拍摄CBCT,功能负载后半年、之后每年进行X线片检查,对种植体脱落率及并发症进行统计分析。结果术中发生上颌窦底黏膜穿孔15例,黏膜穿孔率为10.4%(15/144)。术后上颌窦感染1例。愈合期内2枚种植体脱落,种植体早期成功率为98.6%(142/144)。功能负载后随访3枚种植体松动脱落,其余功能行使良好,功能负载后种植体存留率为97.8%(135/138)。结论采用扩孔钻法行经牙槽嵴顶上颌窦底提升及同期种植体植入术临床操作简单,创伤小,短期内临床效果可靠,为经牙槽嵴顶上颌窦底提升的术式选择提供新的思路。 Objective To evaluate the clinical results of placing dental implants in the posterior maxilla using twist drill technique.Methods Between July 2018 and June 2020,a total of 109 consecutive patients(144 implants)undergoing crestal sinus floor elevations with twist drill technique were enrolled in this study.Each patient had at least a unilateral edentulous area,with residual bone height(RBH)of 4-9mm in the posterior maxilla.The data analysis was performed by radiological measures to assess the complications after surgery,failure rates and the performance of rehabilitation.Results Schneiderian membrane perforation was observed in 15 patients,resulting in a perforation rate of 10.4%(15/144).Maxillary sinusitis occurred in one patient.Two implants failed during the healing time,the early success of implants was 98.6%(142/144).Three implants failed after loading,all other implants were stable and in function,with the survival rate of 97.8%(135/138).Conclusions Crestal sinus floor elevations with simultaneous implants placement by the twist drill technique proves to be less invasive and easy to operate and the clinical effect is reliable in the short term.
作者 刘颜彬 罗晨晨 杨博 左晓云 高文莫 陈明 LIU Yan-bin;LUO Chen-chen;YANG Bo;ZUO Xiao-yun;GAO Wen-mo;CHEN Ming(Department of Dental Implant Center,Capital Medical University School of Stomatology,Beijing 100050,China)
出处 《北京口腔医学》 CAS 2023年第5期339-342,共4页 Beijing Journal of Stomatology
关键词 经牙槽嵴顶上颌窦底提升 扩孔钻法 同期植入 并发症 Crestal sinus floor elevation Twist drill technique Simultaneous implants placement Complication
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