半导体制造光刻机发展分析

Analysis on the Development of Lithography Equipment for Semiconductor

分析了半导体产业国际国内市场状况,研究了光刻机国际国内市场状况、竞争企业状况;同时从生产线应用配置、细分技术、行业应用、竞争因素、主要技术与供应链、技术发展趋势等角度对光刻机产业发展状况进行了深入分析,并对国内光刻机的发展进行思考。

The international and domestic market status of the semiconductor industry is analyzied in this paper,the international and domestic market status of lithography equipment,and the competitive enterprise situation are studied.Furthermore,the development status of the lithography equipment industry are analyzed deeply from the perspectives of production line application configuration,segmenting technology,industry application,competitive factors,main technology and supply chain,and technological development trends,and also considered about the domestic development of lithography equipment.