摘要
介绍了离子束刻蚀系统用的大尺寸离子源、等离子体桥中和器的结构组成,描述了各部件的主要作用和工作原理,简要分析了各参数之间的相互关系;并提供了该类型设备常见故障的识别和排除方法。
This paper introduces the structure and composition of large-sized ion source and plasma bridge neutralizer(PBN)used for ion beam etching(IBE)system,the main functions and working principles of each component are described,and the relationship between each parameter is briefly analyzed.The methods of identifying and troubleshooting of this type of equipment are also provided.
作者
徐俊
申强
孙运玺
XU Jun;SHEN Qiang;SUN Yunxi(The 55th Research Institute of CETC,Nanjing 210016,China)
出处
《电子工业专用设备》
2023年第5期41-45,共5页
Equipment for Electronic Products Manufacturing
关键词
离子束
离子源
刻蚀
等离子体桥中和器
Ion beam
Ion source
Etching
Plasma bridge neutralizer(PBN)
