有机氟酸蚀刻提高熔石英的抗激光损伤性能

Improving laser damage resistance of fused silica by organic fluoric acid etching

熔石英元件的抗激光损伤性能对高能激光器的稳定运行具有重要意义。为了提升熔石英元件抗激光损伤性能,针对传统氢氟酸蚀刻产生再沉积物的缺点,提出了采用有机氟酸蚀刻提升熔石英元件抗激光损伤性能的方法。有机氟酸蚀刻的优势在于产物具有较好的溶解性,因而产生再沉积物的可能性降低。采用有机氟酸溶液静态蚀刻熔石英元件,并对元件的表面质量、透过率和激光损伤密度进行了表征分析。表面质量和透过率的结果一致显示熔石英元件经有机氟酸蚀刻后,元件表面的再沉积物和污垢较少,表明有机氟酸具有较好的抑制再沉积物生成的效果。激光损伤密度结果显示,有机氟酸蚀刻熔石英的深度为6μm时,元件的平均激光损伤密度为0.26 cm^(−2),接近先进缓释处理2(AMP2)工艺的水平。基于有机氟酸蚀刻提高熔石英元件的抗激光损伤性能为激光负载能力的提升开辟了一条新途径。

The laser damage resistance of fused silica optics is of great significance for the stable operation of high-power laser systems.To improve the laser damage resistance of fused silica optics,and to solve the problem of deposition formed by traditional hydrofluoric acid etching,a method based on organic fluoric acid etching is developed.The advantage of organic fluoric acid etching is that the etching product has good solubility,thus reducing the possibility of forming deposition.Organic fluoric acid solution was used for static etching of fused silica optics,and the surface quality,transmittance,and laser damage density of the opticss were characterized and analyzed.The results of surface quality and transmittance show that the fused silica optics after organic fluoric acid etching have less deposition and impurity,indicating that the organic fluoric acid etching is effective in preventing the formation of deposition.The laser damage tests show that the fused silica optics after 6μm etching have the average laser damage density of 0.26 cm−2,which is close to those treated by advanced mitigation process(AMP2).Organic fluoric acid based etching for improving the laser damage resistance of fused silica optics has opened up a new pathway in enhancing laser loading capacity.