半导体新材料清洗废水处理技术研究及展望

Research and Prospect of Cleaning Wastewater Treatment Technology of SemiconductorNew Materials

半导体新材料的广泛使用与不断发展,使得生产半导体新材料过程产生了大量的清洗废水,如果对其处理不当,容易导致环境污染。因此,论文研究了半导体新材料清洗废水处理技术,并结合目前成功的工程案例经验,对半导体新材料废水进行研究,明确了采用分水及针对不同废水材料采用不同的预处理工艺,并采用A2/O+MBR组合工艺处理半导体新材料清洗废水,能保证出水达到DB 44/26—2001《广东省水污染物排放限值》第二时段一级排放标准要求。

The wide use and continuous development of new semniconductor materials make the process of producing new semiconductor materials produce a largc number of cleaning w astewater,ifit is not properly treated,it is easy to lead to environmental pollution.Therefore,this paper studies the treatment technology of semiconductor new material cleaning wastewater,and combined with the current successful project case experience,studies the semiconductor new material wastewater,defines the use of water separation and different pretreatment processes for different wastewater materials,and uses A2/O+MBR combined process to treat semiconductor new material cleaning wastewater.It can ensure that the eluent meets the requirements of the second period of the first-level discharge standard of DB 44/26-2001 Discharge Limit of Water Pollulant in Guangedong Province.