一种面向蒙皮对缝测量的双线结构光标定方法

A Calibration Method of Double Line Structured Light for Skin Seam Measuremen

针对双线结构光蒙皮对缝测量系统对光平面高精度标定的需求,提出一种基于二维靶标的双线结构光平面标定方法。首先以靶标平面上的基准点为输入,构建靶标平面位姿解算模型,获取其在相机坐标系下的平面方程;然后依据相机的线面模型,对拟合控制点进行深度重建;最后使用特征值法对去噪后的拟合控制点集进行拟合,完成双线结构光平面标定。试验表明,该方法能够同时完成测量系统中两个光平面的标定;标定后系统的对缝间隙重复测量精度优于0.050 mm,对缝阶差重复测量精度优于0.030 mm。

Aiming at the requirement of high-precision calibration of light plane for double-line structured light skin seam measurement system,a calibration method of two-line structured light plane based on planar target is proposed.First,take the datum point on the target plane as input,construct the target plane pose solution model,and obtain its plane equation in the camera coordinate system.Then,according to the line surface model of the camera,the depth of the fitting control points is reconstructed.Finally,the eigenvalue method is used to fit the denoised fitting control point set to complete the calibration of double-line structured light plane.Experiments show that this method can simultaneously complete the calibration of two light planes in the measurement system.After calibration,the repeated measurement accuracy of seam gap is better than 0.050 mm,and the repeated measurement accuracy of seam flush is better than 0.030 mm.