摘要
研究了GH4169合金的氧化机理,设计并开展了650℃对GH4169合金的氧化试验,利用XRD分析了氧化膜的主要产物,利用扫描电镜观察氧化膜的表面及截面形貌,结合EDS能谱数据。结果显示,在650℃下,GH4169合金其表层氧化膜主要由NiCr_(2)O_(4)组成,氧化动力学规律接近于平方抛物线模型。
We studied the oxidation mechanism of GH4169 alloy,designed and conducted oxidation experiments at 650℃on GH4169 alloy,analyzed the main products of the oxide film using XRD,observed the surface and cross-sectional morphology of the oxide film using scanning electron microscopy,and combined with EDS energy spectrum data.The results show that at 650℃,the surface oxide film of GH4169 alloy is mainly composed of NiCr_(2)O_(4),and the oxidation kinetics law is close to the square parabolic model.
作者
刘威
王润
华鹏
华大凤
王树平
邵兴明
Liu Wei;Wang Run;Hua Peng;Hua Dafeng;Wang Shuping;Shao Xingming(Jiangsu Xinhua Alloy Co.,Ltd.,Jiangsu,225722;School of Mechanical and Electronic Engineering,Nanjing Forestry University,Jiangsu,210037)
出处
《当代化工研究》
CAS
2023年第22期35-37,共3页
Modern Chemical Research
