化学机械抛光液的研究现状

Research Status of Chemical Mechanical Polishing Solution

化学机械抛光(CMP)是一种化学腐蚀和机械磨削协同作用的超精密加工技术。化学机械抛光液是化学机械抛光技术中关键的一部分,对材料的全局平坦化处理起到了至关重要的作用。综述了化学机械抛光液中各组分对抛光性能的影响研究。

Chemical mechanical polishing(CMP)is a kind of ultra-precision machining technology with synergistic effect of chemical corrosion and mechanical grinding.CMP solution is a key part of CMP technology,which plays a vital role in the global planarization processing of materials.The influence of components of chemical mechanical polishing solution on polishing performance is summarized.