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基于栅极限流的SiC MOSFET栅电荷测试方案

Measurement Method for Gate Charge of SiC MOSFET Based on Gate Current Limiting
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摘要 SiC MOSFET是一种高性能的电力电子器件,其开通/关断过程中积累/释放的栅电荷Q_(g)对MOSFET的开关速度、功率损耗等参数有重要影响。通常采用在栅极设置恒流源驱动,对时间进行积分的方法来测量Q_(g)。为了降低驱动复杂度,提高测试结果精度和可视性,基于双脉冲测试平台的感性负载回路,改用耗尽型MOSFET限制栅极电流实现恒流充电,对SiC MOSFET进行测试。同时利用反馈电阻将较小的栅极电流信号转换为较大的电压信号。实验结果表明:在误差允许范围(±5%)内该测试方案能较为准确地测得SiC MOSFET的Q_(g),测试结果符合器件规格书曲线。 SiC MOSFETs are high-performance power electronic devices.The parameters of MOSFETs such as switching speed and power loss are greatly influenced by the gate charge Q_(g) that is accumulated or released during the on/off process.The Q_(g) is usually measured by setting up a constant current source drive at the gate and integrating the time.To reduce the drive complexity while improving test result accuracy and visibility,SiC MOSFETs were tested based on the inductive load loop of the double-pulse test platform,and depletion-type MOSFETs were used instead to limit the gate current to realize constant-current charging.A feedback resistor was also used to convert a smaller gate current sig-nal into a larger voltage signal.The experimental results show that the test method is capable of accurately measuring the Q_(g) of SiC MOSFETs within the permitted error range of±5%,and the test results align with the device specification curves.
作者 周浩 魏淑华 刘惠鹏 陈跃俊 张恩鑫 任天一 Zhou Hao;Wei Shuhua;Liu Huipeng;Chen Yuejun;Zhang Enxin;Ren Tianyi(School of Information Science and Technology,North China Unirersity of Technology,Beijing 100144,China;Bejing Huafeng Test&Control Technology Co,Lid,Beijing 100094,China)
出处 《半导体技术》 北大核心 2024年第2期123-130,共8页 Semiconductor Technology
关键词 SiC MOSFET 栅电荷 栅极恒流 感性负载 双脉冲测试 SiC MOSFET gate charge gate constant current inductive load double-pulse test
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  • 1蒋苓利,罗萍,蒲奎,赵璐.低压大电流VDMOS器件栅电荷测量[J].实验科学与技术,2006,4(B12):49-51. 被引量:5
  • 2夏兴隆,张雄,吴忠.功率MOSFET参数测试仪的设计[J].电子器件,2006,29(4):1058-1060. 被引量:3
  • 3戴绍港,胡雯.AD9218及其在通信与雷达系统中的应用研究[J].电子器件,2006,29(4):1346-1348. 被引量:2
  • 4Fairchild Semiconductor International. FQP9N50 Data sheet[Z]. Fairchild semiconductor international: Fairchild semiconduc- tor international, 2000: 1-2,5-6.
  • 5Texas Instruments. THS4131 Data Sheet [Z]. Texas: Texas In- struments Incorporated Company, 2010 : 1, 14-18.
  • 6Freescale Semiconductor Inc. MC56F825x/4x Reference Man- ual[Z]. Texas : Freeseale Semiconductor lnc, 2010 : 31-34,37.
  • 7吉林华微电子股份有限公司.JCS630Datasheet[z].吉林:吉林华微电子股份有限公司,2010:3-4.
  • 8LIAO C N, CHIEN F T, WANG C L, et al. A novel power mosfet structure with shallow junction dual well design [ J]. IEICE Transactions on Electronics, 2007, 90 (5): 937.
  • 9YIIN A J, SCHRIMPF R D, GALLOWAY K F. Gate- charge measurements for irradiated n-channel DMOS power transistors [ J ]. IEEE Transactions on Nuclear Science, 1991, 38 (6) : 1352 - 1358.
  • 10MAKARAN J E. Gate charge control for MOSFET turn- off in PWM Motor drives through empirical means [ J]. IEEE Transactions on Power Electronics, 2010, 25 (5) :1339 -1350.

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