AAO模板制备中高纯Al电解抛光工艺的研究

Study on Electrolytic Polishing of High Purity Al in AAO Template Preparation

阳极氧化铝模板以其低成本、高通量、柔性和结构可控性等特点已被用于制备纳米结构材料和光子器件等模板。为促进规则多孔的形成和控制所需的性能,高纯Al片表面的预处理是必需的。为此本文研究了高纯Al片的抛光条件,将面积相近的阳极Al片与阴极碳板以相互平行的方式垂直放置于高氯酸与乙醇的体积比为1∶7抛光液中。在电解抛光过程中,当外加电压增至9 V以上时,Al片表面开始形成阳极膜,Al片面积越大该阳极膜所受重力势能作用越显著,致使在完成形成均匀阳极膜拐点处对应的电流密度值随Al片面积的增加而增加,且同一Al片面积具有较佳拐点值,以获得理想的表面光洁度。

Anodic aluminum templates,which have low cost,high throughput,flexibility and structural controllability,have been used to fabricate templates such as nanostructured materials and photonic devices.The surface pretreatment of high purity Al patch is necessary for promote the formation of regular pores and control the required performance.Therefore,the polishing conditions of high purity Al patch is studied.The anode Al patch and cathode carbon plate with similar areas were vertically placed in the polishing liquid with a volume ratio of perchloric acid to ethanol of 1∶7 in a parallel way.When the voltage increases by more than 9 V,the surface of Al patch forms an anodic film.The effect of gravitational potential energy on the anode film is more significant with the increase of the area of Al patch,so the current density value at the inflection point of forming a uniform anodic film increases with the increase of Al patch area.To obtain an ideal surface finish,the same Al area has a better inflection point value.