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重离子辐射对AlGaN/GaN高电子迁移率晶体管低频噪声特性的影响

Effect of heavy ion radiation on low frequency noise characteristics of AlGaN/GaN high electron mobility transistors
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摘要 采用^(181)Ta^(32+)重离子辐射AlGaN/GaN高电子迁移率晶体管,获得器件在重离子辐射前后的电学特性和低频噪声特性.重离子辐射导致器件的阈值电压正向漂移、最大饱和电流减小等电学参数的退化.微光显微测试发现辐射后器件热点数量明显增加,引入更多缺陷.随着辐射注量的增加,电流噪声功率谱密度逐渐增大,在注量为1×10^(10)ions/cm^(2)重离子辐射后,缺陷密度增大到3.19×10^(18)cm^(-3)·eV^(-1),不同栅压下的Hooge参数增大.通过漏极电流噪声归一化功率谱密度随偏置电压的变化分析,发现重离子辐射产生的缺陷会导致寄生串联电阻增大. AlGaN/GaN high election mobility transistor(HEMT)has important application prospects in satellite communication,radar,nuclear reactors and other extreme environments,owing to its excellent electrical performance and strong radiation resistance.Heavy ion radiation mainly causes single-event effect and displacement damage effect in AlGaN/GaN HEMT device.In this work,the displacement damage defects introduced by heavy ion radiation are analyzed in detail.With the increase of heavy ion radiation influence,more defects are introduced by displacement damage.These defects reduce the two-dimensional electron gas(2DEG)concentration through carrier capture and removal effect,and reduce the carrier mobility through scattering mechanism,resulting in gradual degradation of the electrical characteristics of the device.In this work,AlGaN/GaN high electron mobility transistors are irradiated by ^(181)Ta^(32+)ions with fluences of 1×10^(8) ions/cm^(2),1×10^(9)ions/cm^(2)and 1×10^(10)ions/cm^(2).The electrical characteristics,EMMI and low-frequency noise characteristics of the device before and after heavy ion radiation are measured.The results show that heavy ion radiation can lead to the degradation of electrical parameters.When the heavy ion radiation dose reaches 1×10^(10)ions/cm^(2),the electrical characteristics of the device deteriorate seriously,the threshold voltage shifts forward by 25%,and the drain saturation current deteriorates obviously.The defect locations introduced by irradiation are analyzed by EMMI test,and it is found that the number of“hot spots”increases significantly after the having been irradiated by heavy ions with a fluence of 1×10^(10)ions/cm^(2),indicating that the radiation leads to the increase of defect density and serious damage to the device.Through the noise test,it is found that with the increase of the radiation fluence,the current noise power spectral density gradually increases.When the fluence reaches 1×10^(10)ions/cm^(2),the defect density increases to 3.19×10^(18)cm^(–3)·eV^(–1),and the Hooge parameter increases after having been irradiated by heavy ions.We believe that the radiation leads to the defect density and parasitic series resistance of AlGaN/GaN HEMT device to increases,resulting in larger Hooge parameters.Through analyzing the variation of the normalized power spectral density of the drain current noise with bias voltage,it is found that the defects caused by heavy ion radiation will cause the parasitic series resistance to increase.
作者 吕玲 邢木涵 薛博瑞 曹艳荣 胡培培 郑雪峰 马晓华 郝跃 LüLing;Xing Mu-Han;Xue Bo-Rui;Cao Yan-Rong;Hu Pei-Pei;Zheng Xue-Feng;Ma Xiao-Hua;Hao Yue(School of Microelectronics,Xidian University,Xi’an 710071,China;School of Mechano-Electronic Engineering,Xidian University,Xi’an 710071,China;Institute of Modern Physics,Chinese Academy of Sciences,Lanzhou 730000,China)
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2024年第3期209-216,共8页 Acta Physica Sinica
基金 国家自然科学基金重点项目(批准号:12035019,62234013)资助的课题。
关键词 重离子辐射 氮化镓 高电子迁移率晶体管 低频噪声 heavy ion radiation GaN high electron mobility transistor low frequency noise
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  • 1胡瑾,杜磊,庄奕琪,包军林,周江.发光二极管可靠性的噪声表征[J].物理学报,2006,55(3):1384-1389. 被引量:18
  • 2Rohit K, Sang Y H, Pearton S J 2005 Appl. Phys. Lett. 87212107.
  • 3Rohit K, Allums K K, Abernathy C R, Pearton S J 2004 Appl. Phys. Lett. 853131.
  • 4Gaudreau F, Carlone C, Houdayer A, Khanna S M 2001 IEEE Trans. Nucl. Sci. 48 1778.
  • 5Lia C S, Subramanian S 2003 IEEE Trans. NucZ. Sci. 50 1998.
  • 6Khanna S M, Estan D, Houdayer A, Liu H C, Dudek R 2004 IEEE Trans. Nucl. Sci. 51 3585.
  • 7Sawyer S, Rumyantsev S L, Shur M S 2006 J. Appl. Phys. 100 034504.
  • 8Rumyantsev S L, Wetzel C, Shur M S 2006 J. Appl. Phys. 100 084506.
  • 9Khanna S M, Webb J, Tang H, Houdayer A J, Carlone C 2000 IEEE Trans. Nucl. Sci. 47 2322.
  • 10Chang M H, Das D, Yarde P Y, Pecht M 2012 Microelectron. Reliab. 525762.

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