刻蚀法制备高透过率防眩高铝玻璃

High Transmittance Anti-glare High Aluminum Glass Prepared by Etching Method

目的采用刻蚀法制备了具有高透过率的高铝玻璃,分析刻蚀时间对玻璃表面形貌和性能的影响。方法将经过HF(2.3 mol/L)溶液酸洗10 min后的玻璃样品清洗烘干,然后放入H_(2)SO_(4)(0.1 mol/L)、HCl(0.4mol/L)、Na_(2)SiF_(6)(0.02mol/L)的混合溶液中进行不同时间的表面刻蚀处理,形成了超表面凹坑结构,这种结构使部分光线经过有限次数的反射和折射后成为透射光的一部分,这种凹坑结构也相当于在空气和玻璃之间增加了一个具有梯度折射率的介质层,从而减少反射率、增加透过率。通过扫描电镜(SEM)、原子力显微镜(AFM)、X射线能谱仪(EDS)、紫外可见近红外分光光度计等仪器,对刻蚀前后玻璃的表面进行分析研究。结果随着刻蚀时间的延长,蚀坑的直径逐渐增大,同时致密度也在逐渐增加直至相互融合,而坑深先增大后减小。可见光波长范围内的平均透过率先增加后降低,反射率先降低后增加,且透过率均大于玻璃原片,反射率均小于玻璃原片。刻蚀前后玻璃成分基本不变,铅笔硬度达到9H。结论刻蚀后,在玻璃表面形成超表面凹坑结构,当刻蚀时间为20 min时,蚀坑直径达到2.5~5.0μm,深度达到927.2 nm左右,平均透过率达到95.95%,平均反射率达到4.01%。

Chemical etching is a widely used surface treatment technique that can improve the optical properties of materials,such as transmittance,gloss,etc.In order to obtain high aluminum glass with high transmittance,the high aluminum glass was treated to get anti-glare and anti-reflection performance and the transmittance was improved by chemical etching.The samples were cleaned with surfactants,and then placed in a mixed solution of ultrapure water,ethanol and acetone and washed ultrasonically at 25℃for 30 min and finally washed and dried with ultrapure water.The samples were then pickled in 2.3 mol/L HF solution and reacted at 25℃for 10 min and removed and washed with ultrapure water.After drying,the pickled samples were placed in containers containing 0.1 mol/L H_(2)SO_(4),0.4 mol/L HCl,0.02 mol/L Na_(2)SiF_(6) solution and etched for different time.After the reaction at 25℃,the samples were taken out,washed with ultrapure water,and dried to obtain high aluminum glass with high transmittance.The glass surface was analyzed and studied by scanning electron microscopy(SEM),X-ray spectroscopy(EDS),atomic force microscopy(AFM),ultraviolet-visible near-infrared spectrophotometer and other instruments.The surface of the unetched high aluminium glass presented a smooth and neat form.After etching,the surface had meta-surface pit structure,which was mainly used to change the optical path.When the light entered the surface structure,part of the light after a limited number of reflections and refractions became part of the transmitted light,and this pit structure was also equivalent to adding a dielectric layer with a gradient refractive index between air and glass,thereby reducing reflectivity and increasing transmittance.When the etching time was 5 min,a relatively sparse etching pit with a diameter of about 1.0-2.5μm and a pit depth of about 600 nm appeared,with an average transmittance of 93.28%and an average reflectivity of 6.57%.With the extension of the etching time,the diameter of the etching pit gradually increased,the density gradually increased,and the etching pits began to contact each other.When the etching time reached 20 min,the diameter of the pit was about 2.5-5.0μm,the depth of the pit was about 927.2 nm,the average transmittance reached 95.95%,which was 4.13%higher than that of the original unetched glass sheet,and the average reflectivity reached 4.01%,which was 4.10%lower than that of the original unetched glass sheet.When the etching time reached 30 min,the etching pits contacted and fused with each other,the depth of the pits decreased after fusion,the glass surface gradually flattened,the diameter of the pits was about 3.5-7.0μm,the depth of the pits was about 862.4 nm,the average transmittance reached 95.09%,and the average reflectivity reached 4.90%.The composition of the glass before and after etching is basically unchanged,and the hardness of the pencil reaches 9H,which can also verify that the etching method is a film layer formed by etching directly on the glass body,and the film layer is closely combined with the glass matrix,and the film layer strength is higher.Chemical etching can prepare large-area anti-reflective glass,and its application prospects are very broad.