摘要
He/CF4等离子体在表面改性领域得到了广泛的应用。采用一维流体模型对大气压He/CF4脉冲介质阻挡放电等离子体进行了数值模拟,通过计算分析等离子体在放电过程中各粒子的浓度以及各反应的贡献率,研究了不同放电参数(放电间隙、介质板厚度和相对介电常数)对等离子体的影响。结果表明:电子碰撞反应在各活性粒子的生成中均起到了重要作用;不同放电参数对各粒子浓度和产物粒子的反应贡献率产生不同的影响。
Surface modification of various materials by He/CF4 plasma has gained much attention.A one-dimensional fluid model is used to numerically simulate the atmospheric pressure He/CF4 pulsed dielectric barrier discharge plasma.By analyzing and calculating the concentration of each particle produced during the discharge process and its reaction contribution,the effect of different discharge parameters(the discharge gap,the thickness of the dielectric plate,and the relative dielectric constant)on plasma is investigated.It is shown that electron collision reaction plays an important role in the production of active particles.Different discharge parameters have varying effects on particle concentration and reaction contribution of product particles.
作者
郭文强
陈歆羡
吉杰
GUO Wenqiang;CHEN Xinxian;JI Jie(School of Electrical Engineering,Shanghai University of Electric Power,Shanghai 200090,China)
出处
《上海电力大学学报》
CAS
2024年第1期93-100,共8页
Journal of Shanghai University of Electric Power
关键词
脉冲介质阻挡放电
一维流体模型
反应贡献率
pulsed dielectric barrier discharge
one-dimensional fluid model
reaction contribution rate