摘要
影响高性能芯片的物理设计涉及多个关键因素,文章分析了其中主要的5个因素:标准单元库、核心IP库、布局布线、制造工艺、物理设计与EDA工具/Foundry的协作优化.通过对基本情况介绍,当前行业情况分析等,剖析了影响高性能芯片设计及制造的核心因素,对高性能芯片未来需要重点发展的方向提出了一些探讨思路.
The physical design of high-performance chips is influenced by multiple critical factors.This paper analyzes five main factors:standard cell library,intellectual property(IP)library,place and route,manufacturing process,and collaborative optimization of physical design with electronic design automation(EDA)tools/Foundry.Through an introduction to the fundamental aspects and an analysis of the current industry situation,this study explores the core elements that impact the design and manufacturing of high-performance chips.Furthermore,it provides insights into future directions that need to be emphasized in the development of high-performance chips.
作者
樊凌雁
黄灿坤
朱志伟
刘海銮
马香媛
Lingyan FAN;Cankun HUANG;Zhiwei ZHU;Hailuan LIU;Xiangyuan MA(Micro-Electronics Research Institute,Hangzhou Dianzi University,Zhejiang 310018,China)
出处
《中国科学:信息科学》
CSCD
北大核心
2024年第1期110-120,共11页
Scientia Sinica(Informationis)
基金
国家自然科学基金(批准号:U22A2071)
浙江省软科学重点项目(批准号:2023C25023)
浙江省万人计划项目(批准号:2020R52019)资助。
关键词
高性能芯片
物理设计
集成电路IP
核
EDA
布局布线
high-performance chips
physical design
intellectual property core
EDA
place and route