集成电路装备光刻机发展前沿与未来挑战

Development frontier and future challenges of lithography machines for integrated circuit manufacturing

光刻机是集成电路制造中最为核心的高端装备,在60余年的发展历程中不断挑战人类超精密制造装备的极限,推动着摩尔定律的持续向前和信息时代的飞速发展,对于科技进步、国民经济、国家安全具有极为重要的战略意义.本文阐述了光刻机在集成电路制造装备中的核心地位,介绍了光刻的基本原理,梳理了国际上光刻机从20世纪60年代至今的发展脉络,围绕光刻机三大核心部件分析了光刻机中的关键技术及面临的极限技术挑战.在此基础上,本文展望了未来光刻机的发展趋势和未来方向.

The lithography machine is the most core high-end equipment in integrated circuit(IC)manufacturing,and it has challenged the limits of ultra-precision manufacturing equipment continuously over its 60-year development history.It has propelled the constant advancement of Moore’s Law and the rapid development of the information age,holding extremely important strategic significance for technological progress,the national economy,and national security.This paper first elucidates the central role of the lithography machine in IC manufacturing equipment,introduces the basic principles of lithography,and traces the development trajectory of lithography machines from the 1960s to the present.The key technologies and severe technical challenges in lithography machines are discussed by focusing on the three core components.Based on these findings,this paper looks forward to future trends and directions in the development of lithography machines.