用于金刚石摩擦化学抛光的Ni-W合金盘制备

Preparation of Ni-W alloy disc for dynamic friction polishing of diamond

为探究镀液成分、工艺条件等因素对Ni-W合金镀层的影响,制备出低内应力、高硬度的Ni-W合金盘,用于金刚石的摩擦化学抛光。采用单一性实验分别探究络合剂浓度、溶液pH、糖精钠浓度对镀层内应力、钨含量、硬度以及沉积速率的影响,并探究不同添加剂对镀层表面整平的效果。最终选用水杨醛为整平剂,并采用反向脉冲电流降低了镀层表面粗糙度,制备出硬度达HV 713,镀层厚度约为0.66 mm的Ni-W合金盘。使用合金盘对金刚石进行摩擦化学抛光,并探究合适的抛光工艺参数。在合金盘转速为8000 r/min,压力为40 N时,金刚石的抛光效果较好,其材料去除率为5.56μm/min,磨削比达0.394,金刚石表面粗糙度Sa为3.7 nm。使用传统铸铁盘对金刚石进行摩擦化学抛光,通过对比磨损参数发现,Ni-W合金盘能够达到更好的抛光效果。

To investigate the impact of bath composition and process conditions on Ni-W alloy coating,Ni-W alloy discs with low internal stress and high hardness were prepared for dynamic friction polishing of diamonds.The effects of complexing agent concentration,solution pH,and saccharin sodium concentration on the internal stress,tungsten content,hardness,and deposition rate of the coating were investigated by single experiments.Additionally,the effects of different additives on the surface leveling of the coating were also investigated.Finally,salicylaldehyde was selected as the leveling agent,and the reverse pulse current was applied to reduce the surface roughness of the coating.A Ni-W alloy disc with a hardness of HV 713 and a coating thickness of about 0.66 mm was prepared.Diamond dynamic friction polishing was carried out using these alloy discs to explore appropriate polishing process parameters.The best polishing effects were achieved at a disc speed of 8000 r/min and a pressure of 40 N,yielding a removal rate of 5.56μm/min,a grinding ratio of 0.394,and a surface roughness(Ra)of 3.7 nm.Comparing wear parameters revealed that Ni-W alloy discs can achieve better polishing effects using traditional cast iron discs in friction chemical polishing of diamonds.