摘要
介绍了光催化还原U(VI)的研究背景,讨论了光催化还原U(Ⅵ)的基本原理,着重综述了目前典型半导体材料光催化还原水中U(VI)的研究。总结了溶液pH、U(VI)初始浓度以及催化剂投加量等因素对光催化还原U(VI)的影响。指出了半导体材料光催化还原处理水中U(VI)目前存在的问题,提出了光催化还原U(VI)所面临的挑战和未来的发展方向。
The research background of photocatalytic reduction of U(VI)is introduced first,and then the basic principle of photocatalytic reduction of U(VI)is discussed,and the current research on U(VI)of photocatalytic reduction in typical semiconductor materials is reviewed.The effects of the initial concentration of solution pH,U(VI)and the catalyst dosage on the photocatalytic reduction of U(VI)are summarized.The current problems of U(VI)in the water of semiconductor materials are pointed out,and the challenges and future development direction of photocatalytic reduction of U(VI)are proposed.
作者
余泽旭
周书葵
段毅
邹烨
YU Ze-xu;ZHOU Shu-kui;DUAN Yi;ZOU Ye(School of Civil Engineering,University of South China,Hengyang 421001,China)
出处
《应用化工》
CAS
CSCD
北大核心
2024年第2期392-397,共6页
Applied Chemical Industry
基金
国家自然科学基金资助项目(51174117)
湖南省自然科学基金青年基金项目(2023JJ40543)
湖南省教育厅一般项目(21C0273)。
关键词
光催化
还原
机理
铀
photocatalysis
restore
mechanism
uranium