摘要
Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing.Atomic layer deposition(ALD)is a technology that can offer many unique properties to achieve atomic-scale material manufacturing controllability.Herein,we discuss this ALD technology for its applications,attributes,technology status and challenges.We envision that the ALD technology will continue making significant contributions to various industries and technologies in the coming years.
基金
the support from Guangdong Basic and Applied Basic Research Foundation (2020B1515120039)
Guangdong Technology Center for Oxide Semiconductor Devices
the support from National Key R&D Program of China (2022YFF1500400)
the National Natural Science Foundation of China (51835005)
the support from the Natural Sciences and Engineering Research Council of Canada (NSERC)
