磁控溅射用旋转阴极磁场装置的结构设计及磁场分析

Structural Design and Magnetic Field Analysis of a Rotating Cathode Magnetic Field Device for Magnetron Sputtering

针对现有磁控溅射装置在镀膜工作中靶面阴极磁场分布不均匀的问题,设计了一种新型旋转阴极磁场装置。该装置通过旋转机构带动磁场做圆周运动,利用凸轮机构使磁场做上下直线运动。首先,利用3D软件绘制出该装置的三维模型;其次,对阴极磁场磁感应强度进行了有限元分析;最后,通过调整磁轭高度、伸出臂长度以及磁轭-靶材间距优化了磁场,并将优化前后的数值模拟曲线进行了对比分析。结果表明,优化后阴极磁场磁感应强度曲线的均匀度由21%改善到6%,有效改善了靶面磁场均匀性,有利于保证磁控溅射的稳定运行。

To address the problem of uneven cathode magnetic field distribution on the target surface during the coating process of existing magnetron sputtering devices,a new type of rotating cathode magnetic field device is designed.The device drives the magnetic field through a rotating mechanism,and the cam mechanism is used to make the magnetic field to move up and down in a straight line.Firstly,a three-dimensional model of the device is drawn using 3D software.Secondly,a finite element analysis of the magnetic induction intensity of the cathode magnetic field is performed.Finally,the magnetic field is optimized by adjusting the height of the yoke,the length of the extended arm,and the distance between the yoke and the target material,and the numerical simulation curves before and after optimization are compared and analyzed.The results show that the uniformity of the magnetic induction intensity curve of the cathode magnetic field is improved from 21%to 6%after optimization,which effectively improves the uniformity of the magnetic field on the target surface,and beneficial to ensure stable operation of magnetron sputtering.