从特意排除规则对等同原则的限制看专利撰写技巧

Patent Drafting Skills Viewed from the Restriction of the Intentional Exclusion Rule on the Principle of Equivalence

基于《最高人民法院知识产权法庭裁判要旨(2020)》和《最高人民法院知识产权法庭裁判要旨(2021)》中的两个典型案例,分析何种情况会导致特意排除规则的适用,进而形成对等同原则的限制,并从判决要点和涉案专利文件中归纳总结相应的申请文件撰写技巧,以帮助专利权人避免在日后专利侵权诉讼中使用等同原则时存在过多限制,同时对高质量专利申请文件的撰写具有一定启发意义。

Based on two typical cases in the“Judgment Essentials of the Intellectual Property Court of the Supreme People’s Court(2020)”and“Judgment Essentials of the Intellectual Property Court of the Supreme People’s Court(2021)”,this paper analyzes what situations may lead to the application of the intentional exclusion rule,thereby forming a restriction on the principle of equivalence,and summarizes the corresponding application document drafting skills from the key judgment points and the patent documents involved,to help the patentee avoid excessive restrictions when using the principle of equivalence in future patent infringement litigation,and to provide some inspiration for drafting high-quality patent application documents.