射频磁控溅射制备HfMoNbZrN_(x)薄膜的组织和性能

Microstructure and Properties of HfMoNbZrN_(x)Films Prepared by Radio Frequency Magnetron Sputtering

利用射频磁控溅射技术分别在单面抛光Si(001),Al_(2)O_(3)(0001)和硬质合金(WC-8 wt.%Co)基底表面沉积HfMoNbZrN_(x)薄膜,研究不同氮气流量R_(N)对HfMoNbZrN_(x)薄膜的组织和性能影响。结果表明,HfMoNbZr薄膜倾向于形成非晶态,随着R_(N)的增加,HfMoNbZrN高熵合金氮化薄膜转变为面心立方(FCC)结构并且沉积速率下降;当R_(N)=10%时,薄膜硬度和弹性模量最大,分别为21.8GPa±0.88GPa和293.5GPa±9.56GPa;所有薄膜均发生磨粒磨损,相较于多元合金薄膜,氮化物薄膜的磨损率下降了一个数量级,薄膜耐磨性显著提高。

High-entropy alloy and nitride films HfMoNbZrN_(x)are respectively deposited on the surfaces of single-sided polished Si(001),Al_(2)O_(3)(0001)and cemented carbide(WC-8 wt.%Co)substrates by radio frequency magnetron sputtering method to explore the effect of different R_(N) on the microstructure and properties of HfMoNbZrN_(x)films.Results show that the HfMoNbZr multiple alloy film incline to form an amorphous state and that with increasing R_(N),the HfMoNbZrN high entropy alloy nitride films transform into a face centered cubic(FCC)structure and the deposition rate decreases.The film hardness and elastic modulus reach maximum values of 21.8GPa±0.88GPa and 293.5GPa±9.56GPa respectively when R_(N)=10%.Wear tests show that all films exhibited abrasive wear,compared to the multi-alloy film,the nitride films show an order of magnitude reduction in wear rate and a significant increase in film wear resistance.