摘要
This paper systematically investigates the effects of process parameters,such as exposure time and slice thickness,on the polymerization kinetics of a Si_(3)N_(4)ceramic slurry.The higher the C=C conversion rate in the SLA process,the faster the polymerization rate in the slurry during the initial exposure.However,when the UV exposure time is increased from 5 to 20 s,the solidified gel in the slurry hinders the diffusion of free radicals,causing the C=C conversion rate to stop.The slurry achieves a C=C conversion rate of up to 81%and a curing dimensional accuracy of up to IT7 level at an exposure time of 10 s.When the penetration depth of the slurry is equal to the slice thickness,the difference in C=C conversion rates between the ends of the blank is at least 21%.Furthermore,the Si3 N4 ceramics processed by stereolithography exhibit no defects,such as warpage or holes.
基金
supported by Natural Science Foundation of Jiangxi Province of China(Grant No.20212BAB204048)
The Science and Technology Plan Projects of Jiangxi Provincial Department of Education of China(Grant Nos.GJJ.212714,GJJ.2202117).
